Moda archiwum

EN_01043942_0026

30,00 EUR Private use
Making print for private purpose, storage in computer memory, no distribution rights.
40,00 EUR Internet - private use
Strictly for editorial, single use on a personal (nonprofit) web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
75,00 EUR Internet commercial use
Strictly for editorial, single use on a commercial web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
90,00 EUR Print use
Strictly for editorial, single use, inside of newspaper, magazine, book (including digital version), one edition, one single country. Not for resale.

Gross prices

caption

American designer Marc Jacobs poses during a fashion show held by Louis Vuitton in Shanghai, China, 19 July 2012.

headline Moda archiwum

created date 2012-07-19

credit Ge junmei - Imaginechina/East News

source Associated Press

byline Ge junmei/Ge junmei/NYWWP

original transmission reference 120719021673

weight 0,58MB

size 17cm x 24cm by 300dpi

keywords - Show

19, 2012, A, AMERICAN, BY, CHINA, CHINESE, DESIGNER, DURING, FASHION, GE, IN, JACOBS, JULY, JUNMEI, LOUIS, MARC, NYWWP, POSES, SHANGHAI, SHOW, VUITTON,