Tydzień Mody w Nowym Jorku - wybiegi

EN_01001972_2472

30,00 EUR Private use
Making print for private purpose, storage in computer memory, no distribution rights.
40,00 EUR Internet - private use
Strictly for editorial, single use on a personal (nonprofit) web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
75,00 EUR Internet commercial use
Strictly for editorial, single use on a commercial web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
90,00 EUR Print use
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Gross prices

caption

A model displays a creation during the Ralph Lauren show at Skylight Studio of the Fall 2012 Mercedes-Benz Fashion Week in New York, USA-16/02/2012

headline Tydzień Mody w Nowym Jorku - wybiegi

created date 2012-02-16

credit CHINE NOUVELLE/SIPA/EAST NEWS

source SIPA

byline CHINE NOUVELLE/SIPA

original transmission reference SIPA.00632417000013

weight 0,28MB

size 12cm x 15cm by 300dpi

keywords - Show

02, 2012, A, AT, CHINE, CREATION, DISPLAYS, DURING, FALL, FASHION, IN, LAUREN, MERCEDES-BENZ, MODEL, NEW, NOUVELLE, OF, RALPH, SHOW, SKYLIGHT, STUDIO, THE, USA-16, WEEK, YORK,