30,00 EUR Private use
Making print for private purpose, storage in computer memory, no distribution rights.
40,00 EUR Internet - private use
Strictly for editorial, single use on a personal (nonprofit) web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
75,00 EUR Internet commercial use
Strictly for editorial, single use on a commercial web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
90,00 EUR Print use
Strictly for editorial, single use, inside of newspaper, magazine, book (including digital version), one edition, one single country. Not for resale.

Gross prices

special instructions

*** China Out ***

caption

(140905) -- NEW YORK, Sept. 5, 2014 (Xinhua) -- Chinese model Zhang Huijun (R) has make-up applied backstage during the 2015 New York Fashion Week in New York, the United States, on Sept. 4, 2014. (Xinhua/Qin Lang) (Photo by Xinhua/Sipa USA)

headline Tydzień mody w Nowym Jorku - wybiegi

created date 2014-09-05

credit Xinhua/Sipa USA/East News

source Sipa USA

byline Xinhua

original transmission reference sipausa_14016372

weight 0,94MB

size 40cm x 26cm by 300dpi

keywords - Show

2014, 2015, 4, 5, APPLIED, ART, ARTS, BACKSTAGE, BY, CHINESE, CULTURE, DURING, ENTERTAINMENT, FASHION, HAS, HUIJUN, IE, IN, LANG, MAKE-UP, MODEL, NEW, ON, QIN, SEPT, STATES, THE, UNITED, USA, WEEK, XINHUA, YORK, ZHANG,