Tydzień Mody w Nowym Jorku - wybiegi

EN_01001972_2460

30,00 EUR Private use
Making print for private purpose, storage in computer memory, no distribution rights.
40,00 EUR Internet - private use
Strictly for editorial, single use on a personal (nonprofit) web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
75,00 EUR Internet commercial use
Strictly for editorial, single use on a commercial web site, Internet portal, social media (Facebook, Instagram etc.), blog for 1 year. Not for resale. Maximum picture size 2000px.
90,00 EUR Print use
Strictly for editorial, single use, inside of newspaper, magazine, book (including digital version), one edition, one single country. Not for resale.

Gross prices

caption

A model displays a creation during the Ralph Lauren show at Skylight Studio of the Fall 2012 Mercedes-Benz Fashion Week in New York, USA-16/02/2012

headline Tydzień Mody w Nowym Jorku - wybiegi

created date 2012-02-16

credit CHINE NOUVELLE/SIPA/EAST NEWS

source SIPA

byline CHINE NOUVELLE/SIPA

original transmission reference SIPA.00632417000001

weight 0,15MB

size 6cm x 7cm by 300dpi

keywords - Show

02, 2012, A, AT, CHINE, CREATION, DISPLAYS, DURING, FALL, FASHION, IN, LAUREN, MERCEDES-BENZ, MODEL, NEW, NOUVELLE, OF, RALPH, SHOW, SKYLIGHT, STUDIO, THE, USA-16, WEEK, YORK,